Recent status of chemical bath deposited metal chalcogenide and metal oxide thin films

被引：293
作者：
Pawar, S. M. [2 ]
Pawar, B. S. [2 ]
Kim, J. H. [2 ]
Joo, Oh-Shim [1 ]
Lokhande, C. D. [1 ,3 ]
机构：
[1] Korea Inst Sci & Technol, Clean Energy Res Ctr, Seoul 130650, South Korea
[2] Chonnam Natl Univ, Dept Mat Sci & Engn, Photon & Elect Thin Film Lab, Kwangju 500757, South Korea
[3] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, MS, India
来源：
CURRENT APPLIED PHYSICS | 2011年 / 11卷 / 02期
基金：
新加坡国家研究基金会;
关键词：
Metal chalcogenides; Thin films; Nanostructures; Metal oxides; Chemical synthesis; IONIC-LAYER-ADSORPTION; ROOM-TEMPERATURE SYNTHESIS; SOLUTION GROWTH TECHNIQUE; THICKNESS-DEPENDENT PROPERTIES; NANOCRYSTALLINE NICKEL-OXIDE; LPG SENSING PROPERTIES; PAINTED TIO2 COATINGS; OPTICAL-PROPERTIES; ELECTRICAL-PROPERTIES; ZINC-OXIDE;
D O I：
10.1016/j.cap.2010.07.007
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Presently nanocrystalline materials have opened a new chapter in the field of electronic applications, since material properties could be changed by changing the crystallite size and/or thickness of the film. The synthesis of nanocrystalline metal chalcogenide and metal oxide thin films by chemical bath deposition (CBD) method is currently attracting considerable attention as it is relatively inexpensive, simple and convenient for large area deposition. Using CBD and modified CBD (which is also known as successive ionic layer adsorption and reaction, SILAR) methods, a large number of thin films have been deposited. This review is on the status of synthesizing thin films of metal chalcogenide and metal oxides by CBD and SILAR. Properties and applications of the thin films are also summarized. (C) 2010 Elsevier B. V. All rights reserved.
引用
收藏
页码：117 / 161
页数：45
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