Characterization of high-density patterned media fabricated by a new anodizing process

Patterned media with dots of 65 nm period (153 Gdots/in.(2)) and 25 nm period (1.03 Tdots/in.(2)) fabricated by a new anodizing process were investigated. Write/read characteristics were successfully measured with a specific patterned marker providing an accessing method to the narrow patterned area of 10x10 mu m(2). The read-back signals were obtained by a spin stand with a flying head and a static tester with a contact head. Although 1 dot resolution was not achieved in the flying write/read measurement for the media with 25 nm period (1.03 Tdots/in.(2)), it was achieved in the contact write/read measurement. (c) 2008 American Institute of Physics.