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Subthreshold Swing of 59 mV decade-1 in Nanoscale Flexible Ultralow-Voltage Organic Transistors
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作者:

Geiger, Michael
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Lingstaedt, Robin
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Wollandt, Tobias
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Deuschle, Julia
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Zschieschang, Ute
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Letzkus, Florian
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Inst Microelect Stuttgart IMS CHIPS, Allmandring 30A, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Burghartz, Joachim N.
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Inst Microelect Stuttgart IMS CHIPS, Allmandring 30A, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

van Aken, Peter A.
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Weitz, R. Thomas
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Univ Gottingen, Inst Phys 1, Fac Phys, Friedrich Hund Pl 1, D-37077 Gottingen, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany

Klauk, Hagen
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Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany
机构:
[1] Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany
[2] Inst Microelect Stuttgart IMS CHIPS, Allmandring 30A, D-70569 Stuttgart, Germany
[3] Univ Gottingen, Inst Phys 1, Fac Phys, Friedrich Hund Pl 1, D-37077 Gottingen, Germany
关键词:
gate dielectric;
low-voltage operation;
organic transistor;
subthreshold swing;
FIELD-EFFECT TRANSISTORS;
THIN-FILM TRANSISTORS;
SELF-ASSEMBLED MONOLAYERS;
WAFER FLOW PROCESS;
THRESHOLD VOLTAGE;
GATE DIELECTRICS;
LOGIC;
PRESSURE;
CIRCUITS;
SHIFT;
D O I:
10.1002/aelm.202101215
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Organic thin-film transistors (TFTs) that provide subthreshold swings near the theoretical limit together with large on/off current ratios at very low operating voltages require high-capacitance gate dielectrics with a vanishingly small defect density. A promising approach to the fabrication of such dielectrics at temperatures sufficiently low to allow TFT fabrication on polymeric substrates are hybrid dielectrics consisting of a thin metal oxide layer in combination with a molecular self-assembled monolayer (SAM). Here, the electrical and surface properties of titanium oxide produced by the plasma-assisted oxidation of the surface of vacuum-deposited titanium gate electrodes and its use as the first component of a hybrid TiOx/SAM gate dielectric in flexible organic TFTs are investigated. These transistors have a gate-dielectric capacitance of about 1 mu F cm(-2), a subthreshold swing of 59 mV decade(-1) (within measurement error of the physical limit at room temperature) for a wide range of channel lengths as small as 0.7 mu m, and an on/off current ratio of 10(7) for a gate-source-voltage range of 1 V.
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