Thermally activated double-carrier transport in epitaxial graphene on vanadium-compensated 6H-SiC as revealed by Hall effect measurements

被引:19
作者
Ciuk, Tymoteusz [1 ]
Kozlowski, Andrzej [1 ]
Michalowski, Pawel Piotr [1 ]
Kaszub, Wawrzyniec [1 ]
Kozubal, Michal [1 ,2 ]
Rekuc, Zbigniew [1 ]
Podgorski, Jaroslaw [1 ]
Stanczyk, Beata [1 ]
Przyborowska, Krystyna [1 ]
Jozwik, Iwona [1 ]
Kowalik, Andrzej [1 ]
Kaminski, Pawel [1 ]
机构
[1] Inst Elect Mat Technol, Wolczynska 133, PL-01919 Warsaw, Poland
[2] VIGO Syst SA, Poznanska 129-133, PL-05850 Warsaw, Poland
基金
欧盟地平线“2020”;
关键词
Graphene; Epitaxy; CVD; Hall effect; Sensor; Atomic layer deposition; Transport properties; CHEMICAL-VAPOR-DEPOSITION;
D O I
10.1016/j.carbon.2018.07.049
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this report we demonstrate the results of charge carriers transport studies in graphene using a Hall effect sensor fabricated on quasi-free-standing monolayer graphene grown on a semi-insulating on-axis vanadium-compensated 6H-SiC(0001) substrate in an epitaxial Chemical Vapor Deposition process. The sensor is passivated with aluminum oxide through atomic layer deposition and offers current-mode sensitivity of 140 V/AT with thermal stability of - 0.02%/K within the range between 80 and 573 K. The electrical properties of the graphene layer are determined as a function of temperature ranging from 300 to 770 K. High-temperature characteristics of passivated and not passivated graphene are compared and their profiles explained through a double carrier transport involving the spontaneous-polarizationinduced holes in the graphene layer and the thermally activated electrons from a shallow donor level of nitrogen in the quasi-cubic (k(1)) site and a deep acceptor level of vanadium in the hexagonal (h) site both present in the bulk of the vanadium-compensated SiC substrate. Finally, we conclude that this mechanism is directly responsible for the limitation of the thermal stability of the sensor's current-mode sensitivity. (C) 2018 Elsevier Ltd. All rights reserved.
引用
收藏
页码:776 / 781
页数:6
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