High Temperature Measurement of Elastic Moduli of (0001) Gallium Nitride

被引:2
|
作者
Hicks, M. -L. [1 ]
Tabeart, J. [1 ]
Edwards, M. J. [1 ]
Le Boulbar, E. D. [1 ]
Allsopp, D. W. E. [1 ]
Bowen, C. R. [1 ]
Dent, A. C. E. [1 ]
机构
[1] Univ Bath, Fac Engn & Design, Bath BA2 7AY, Avon, England
关键词
Elastic modulus; gallium nitride; dynamic mechanical thermal analysis; BRILLOUIN-SCATTERING; YOUNGS MODULUS; GAN; CONSTANTS; STRAIN; FURNACE; SILICON; ALN;
D O I
10.1080/10584587.2012.663309
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper aims to review the consistency of existing GaN stiffness data and measure the high temperature elastic moduli of free-standing (0001) GaN. Dynamic mechanical thermal analysis (DMTA) and impact excitation were used to determine the E-33 elastic modulus at room temperature and at temperatures up to 550 degrees C. At room temperature, E-33 ranged from 304 GPa to 279 GPa depending on the specific sample and measurement method. Using DMTA and a calibration with silicon, the elastic modulus decreased by 2.17% between 100 degrees C and 500 degrees C, in close agreement with the literature. By testing samples cut at a range of crystal orientations the isotropy of the stiffness in the (0001) plane was confirmed.
引用
收藏
页码:17 / 24
页数:8
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