Nano-oxidation of ferromagnetic thin films as direct surface modification using AFM

被引：0

作者：

Takemura, Y ^{[1
]}

Shirakashi, J ^{[1
]}

机构：

[1] Yokohama Natl Univ, Yokohama, Kanagawa 2408501, Japan

来源：

MAGNETIC MATERIALS, PROCESSES, AND DEVICES VII AND ELECTRODEPOSITION OF ALLOYS, PROCEEDINGS | 2003年 / 2002卷 / 27期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

NiFe thin films of 20 nm thickness were selectively oxidized using an atomic force microscope (AFM). The dot structures of NiFe -oxide were fabricated by applying a pulse voltage to the AFM cantilever. The height and diameter of the dots were controlled by changing the pulse voltage. The diameter of the dots did not strongly depended on the duration of the pulse. These experimental results are supported by the theoretical model assuming the threshold electric field strength for the oxidation.

引用

页码：444 / 449

页数：6

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