In-situ Deposition of Graphene Oxide Catalyst for Efficient Photoelectrochemical Hydrogen Evolution Reaction Using Atmospheric Plasma

被引：33

作者：

Alam, Khurshed ^{[1
]}

Sim, Yelyn ^{[1
]}

Yu, Ji-Hun ^{[2
]}

Gnanaprakasam, Janani ^{[1
]}

Choi, Hyeonuk ^{[1
]}

Chae, Yujin ^{[1
]}

Sim, Uk ^{[1
]}

Cho, Hoonsung ^{[1
]}

机构：

[1] Chonnam Natl Univ, Dept Mat Sci & Engn, Gwangju 61186, South Korea

[2] Korea Inst Mat Sci, Ctr 3D Printing Mat Res, Chang Won 41508, South Korea

来源：

MATERIALS | 2020年 / 13卷 / 01期

基金：

新加坡国家研究基金会;

关键词：

photoelectrochemical cell; graphene oxide; hydrogen; atmospheric plasma; hydrophobicity; hydrophilicity; RAMAN-SPECTRUM; REDUCTION; GROWTH;

D O I：

10.3390/ma13010012

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The vacuum deposition method requires high energy and temperature. Hydrophobic reduced graphene oxide (rGO) can be obtained by plasma-enhanced chemical vapor deposition under atmospheric pressure, which shows the hydrophobic surface property. Further, to compare the effect of hydrophobic and the hydrophilic nature of catalysts in the photoelectrochemical cell (PEC), the prepared rGO was additionally treated with plasma that attaches oxygen functional groups effectively to obtain hydrophilic graphene oxide (GO). The hydrogen evolution reaction (HER) electrocatalytic activity of the hydrophobic rGO and hydrophilic GO deposited on the p-type Si wafer was analyzed. Herein, we have proposed a facile way to directly deposit the surface property engineered GO.

引用

页数：11

共 37 条

[1]

[Anonymous], 2013, NEW DEV PHOTON MAT R

[2] Two-dimensional transition metal chalcogenide composite/reduced graphene oxide hybrid materials for hydrogen evolution application [J].