Short-wavelength infrared HgCdTe photovoltaic detectors fabricated by boron implantation

被引:0
作者
Zhao, J [1 ]
Wang, Q [1 ]
Fang, JX [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, State Key Labs Transducer Technol, Shanghai 200083, Peoples R China
来源
INFRARED DETECTORS AND FOCAL PLANE ARRAYS V | 1998年 / 3379卷
关键词
HgCdTe; IR detectors; ion implantation;
D O I
10.1117/12.317631
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
Short wavelength (SWIR) devices have been fabricated using boron implantation. The capacitance-voltage measurement has been used to examine the junction doping profiles. The junction doping profile can be n/n(-)/p type or n/p type depending on the p-side doping concentration. Only the junctions made on the lightly doped substrates show the n/n(-)/p type abrupt junction, with the n(-) region in the low 1x10(14)cm(-3) range. On the heavily doped substrates, we obtain the n/p type graded junctions. The peak detectivity D*(lambda p) performance at room temperature of the large area (A(j) = 5.9mm(2)) detector was about 2.6x10(11) cm-Hz(1/2)/W at the zero bias. Higher D*(lambda p) performance about 1.4x10(12) cm-Hz(1/2)/W was obtained on smaller area detectors at 250K.
引用
收藏
页码:618 / 622
页数:5
相关论文
empty
未找到相关数据