AlN/SiO2/Si3N4/Si(100)-Based CMOS Compatible Surface Acoustic Wave Filter With -12.8-dB Minimum Insertion Loss

被引:30
作者
Kaletta, Udo Christian [1 ]
Wipf, Christian [1 ]
Fraschke, Mirko [1 ]
Wolansky, Dirk [1 ]
Schubert, Markus Andreas [1 ]
Schroeder, Thomas [1 ,2 ]
Wenger, Christian [1 ]
机构
[1] Leibniz Inst Innovat Microelect, D-15236 Frankfurt, Germany
[2] Brandenburg Univ Technol Cottbus Senftenberg, D-03042 Cottbus, Germany
关键词
Aluminum nitride (AlN); CMOS; finite-element method (FEM); insertion loss (IL); Si(100); surface acoustic wave (SAW); SAW DEVICES; ALN; RESONATORS; LAYERS;
D O I
10.1109/TED.2015.2395443
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A CMOS compatible AlN/SiO2/Si3N4/Si(100) surface acoustic wave (SAW) device has been fabricated and will be compared with standard AlN/SiO2-based devices. The presented filter demonstrates high potential for CMOS integrated high-frequency SAW devices. The filter insertion loss could be improved to -12.8 dB. The device exhibits high crosstalk suppression of -50 dB on a standard Si-substrate (10 Omega cm). X-ray diffraction, (scanning) transmission electron microscopy, and energy dispersive X-ray spectroscopy studies correlate the signal quality with c-axis orientation of aluminum nitride films on interdigitated transducer finger electrodes. Finite-element method simulations are in good agreement with the electric measurements and show typical Rayleigh particle displacement.
引用
收藏
页码:764 / 768
页数:5
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