On the stability of the production of bubbles in yield-stress fluid using flow-focusing and T-junction devices

被引:13
作者
Laborie, B. [1 ,2 ]
Rouyer, F. [3 ]
Angelescu, D. E. [2 ,4 ]
Lorenceau, E. [1 ]
机构
[1] Univ Paris Est, IFSTTAR, ENPC ParisTech, CNRS,UMR 8205,Lab Navier, 2 Allee Kepler, F-77420 Champs Sur Marne, France
[2] Univ Paris Est, ESIEE Paris, ESYCOM, 2 Blvd Blaise Pascal, F-93162 Noisy Le Grand, France
[3] Univ Paris Est, IFSTTAR, ENPC ParisTech, CNRS,UMR 8205,Lab Navier, 5 Bd Descartes, F-77454 Champs Sur Marne, France
[4] Fluid SAS, 231 Rue St Honore, F-75001 Paris, France
关键词
SURFACE-TENSION; EMULSIONS; SUSPENSIONS; ELASTICITY; PARTICLES; DYNAMICS; GLASSES; SLIP; WALL;
D O I
10.1063/1.4953678
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
We investigate experimentally the stability of bubble production in yield-stress fluids (YSF) and highly viscous silicone oil, using flow-focusing and T-junction devices. When the exit channel is initially pre-filled with the fluid and the gas is pressure-driven, the production is highly unstable, despite a regular frequency of bubble production in the junction. As observed for pressure-driven bubble trains in Newtonian fluids, we report that two mechanisms can explain these observations: (i) drastic reduction of the hydrodynamic pressure drop along the channel during the transient bubble production, which induces a rapid increase of the gas flow rate and (ii) thin film deposition resulting in a cascade of plug break-up and bubble coalescence. While the drastic reduction of the pressure drop is inevitable in such two-phase flows, we show that modifying the surfaces of the channel can help to stabilize the system when the continuous phase is a YSF. To do so, we measure the thickness of the film deposited on the channel wall for rough and smooth channels. Our results are rationalized by introducing the inverse of the Bingham number Bi-1 comparing the viscous stress to the yield stress. For Bi-1 >= 1, a fast fluidization process associated to efficient deposition of YSF on the channel wall leads to a rapid destabilization of bubble production. However, for Bi-1 < 1, the deposition driven by capillarity can be hindered by the wall-slip induced by the existence of the yield stress: the thickness of the deposited film is very thin and corresponds to the equivalent roughness of the channels. It is typically 40 mu m thick for rough surfaces and below the limit of resolution of our set-up for smooth surfaces. In this regime of Bi-1 and for smooth surfaces, the length of the plugs barely vanishes, thus the start-up flow is less prone to destabilization. These results therefore potentially open routes to steady production of aerated YSF on smooth channels in the regime of small Bi-1. Published by AIP Publishing.
引用
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页数:14
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