Homogenous and ultra-shallow lithium niobate etching by focused ion beam

被引:10
|
作者
Qu, Minni [1 ]
Shen, Yunliang [1 ]
Wu, Liying [1 ]
Fu, Xuecheng [1 ]
Cheng, Xiulan [1 ]
Wang, Ying [1 ]
机构
[1] Shanghai Jiao Tong Univ, Ctr Adv Elect Mat & Devices, Sch Elect Informat & Elect Engn, 800 Dongchuan Rd, Shanghai 200240, Peoples R China
来源
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY | 2020年 / 62卷
关键词
Lithium niobate; Focused ion beam; Ultra-shallow etching; Surface roughness; MICRODISK RESONATORS; SURFACE-ROUGHNESS; WAVE-GUIDE; SILICON; FABRICATION;
D O I
10.1016/j.precisioneng.2019.11.001
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Focused ion beam (FIB) milling has been used for fast prototyping of lithium niobate (LiNbO3, LN) devices with feature size from sub-to hundreds of micrometers. However, a promising and challenging depth range of tens-of-nanometers or below is rarely attended. Moreover, the surface roughness, related closely with device performances, is particularly non-negligible for such an ultra-shallow etching. Here, the surface roughness evolution was studied on ultra-shallow FIB etched LN structures. It was found that the inhomogeneous etching of the metallic film, coated on LN surface to avoid charge accumulation, had a detrimental effect on the LN surface roughness control. By thinning the gold thickness to 7 nm, sub-nanometer surface roughness was reported for etching depth of several nanometers. This work paves the way towards a homogenous and ultra-shallow FIB milling of LN nano-structures.
引用
收藏
页码:10 / 15
页数:6
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