A new approach to accurate resistivity measurement for a single nanowire - Theory and application

被引:0
作者
Gu, Wenhua [1 ]
Kim, Kyekyoon Kevin
机构
[1] Univ Illinois, Thin Film & Charged Particle Res Lab, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源
IEEE NMDC 2006: IEEE NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE 2006, PROCEEDINGS | 2006年
关键词
resitivity; nanowire; four-contact;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new four-contact method is proposed to accurately determine the resistivity of a single nanowire and of other nanostructures. Unlike the conventional four-contact method or two-contact method, the new scheme does not require nonrectifying (Ohmic) contacts to the nanowire, and can completely eliminate the systematic errors resulting from the contact resistance or the resistance difference between the contacts. The present method has been successfully applied to a copper nanowire and can be used as a universal resistivity measurement scheme for all nanowires and other nanostructures.
引用
收藏
页码:304 / +
页数:2
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