Strain and Intermixing in Single Ge/Si Quantum Dots Observed by Tip-enhanced Raman Spectroscopy

被引:0
|
作者
Toizumi, T. [1 ]
Yuasa, Y. [1 ]
Ogawa, Y. [1 ]
Katayama, K. [1 ]
Minami, F. [1 ]
Baranov, A. V. [2 ]
机构
[1] Tokyo Inst Technol, Dept Phys, Meguro Ku, Tokyo 1528551, Japan
[2] Vavilov State Opt Inst, St Petersburg 199034, Russia
关键词
Tip-enhanced Raman scattering; quantum dots; strain; intermixing; DIFFRACTION; ISLANDS; SIGE;
D O I
10.1063/1.3666499
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Tip-enhanced Raman spectra of as-grown self-assembled Ge/Si quantum dots have been observed with nano-scale spatial resolution. It is found that the Ge-Ge and Si-Ge modes in the Raman spectra were significantly enhanced only when the tip was on the Ge/Si dots. The Ge content in a single dot was estimated from the relative intensity of the Ge-Ge and Si-Ge modes. It is also found that the Si substrate peak at 520 cm(-1) was shifted considerably in the neighborhood of the Ge/Si dots. This means that the Si substrate suffers stress around the dots.
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页数:2
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