Analysis of Inverse Lifetime Curves of TaOx Electron-Selective Contacts for Si Solar Cells

被引:0
作者
Arulanandam, Madhan K. [1 ]
Kumar, Niranjana Mohan [1 ]
Zhang, Chaomin [1 ]
Iyer, Abhishek [2 ]
Opila, Robert L. [2 ]
King, Richard R. [1 ]
机构
[1] Arizona State Univ, Tempe, AZ 85281 USA
[2] Univ Delaware, Newark, DC 19716 USA
来源
2019 IEEE 46TH PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC) | 2019年
关键词
TaOx; electron selective contact; minority charge carrier lifetime; silicon; surface recombination velocity; rapid thermal annealing; SURFACE PASSIVATION; CARRIER; J(0)-ANALYSIS;
D O I
10.1109/pvsc40753.2019.8981188
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The analysis of Auger-corrected inverse minority-carrier lifetime as a function of excess carrier concentration can impart information about many crucial solar cell material properties including: emitter saturation current density (J(o)), surface recombination velocity (SRV), Shockley-Read-Hall (SRH) recombination in the bulk, trap density, band bending, surface Fermi-level pinning, and bandgap narrowing. This work demonstrates TaOx as a potential electron selective contact and passivation layer on silicon. Increasing TaOx thickness reduces the measured upper limit of effective surface recombination velocity (S-eff,S-UL). The minimum S-eff,S-UL is 55 cm/s for CZ n-Si / 30 nm TaOx interfaces. S-eff,S-UL increases for Si / TaOx / ITO structures due to unfavorable band bending.
引用
收藏
页码:983 / 988
页数:6
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