Observation of non-gaussian conductance fluctuations at low temperatures in Si:P(B) at the metal-insulator transition -: art. no. 216603

被引:52
作者
Kar, S [1 ]
Raychaudhuri, AK
Ghosh, A
von Löhneysen, H
Weiss, G
机构
[1] Indian Inst Sci, Dept Phys, Bangalore 560012, Karnataka, India
[2] Univ Karlsruhe, Inst Phys, D-76128 Karlsruhe, Germany
关键词
D O I
10.1103/PhysRevLett.91.216603
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We report investigations of conductance fluctuations (with 1/f(alpha) power spectra) in doped silicon at low temperatures (T<20 K) as it is tuned through the metal-insulator transition (MIT) by changing the carrier concentration n. The scaled magnitude of noise, gamma(H), increases with decreasing T following an approximate power law gamma(H)similar toT(-beta). At low T, gamma(H) diverges as n decreases through the critical concentration n(c), accompanied by a growth of low-frequency spectral weight. The second spectrum and probability density of the fluctuations show strong non-Gaussian behavior below 20 K as n/n(c) decreases through 1. This is interpreted as the onset of a glassy freezing of the electronic system across the MIT.
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页数:4
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