Fabrication of Transparent Conductive Al-doped ZnO Thin Films by Aerosol-assisted Chemical Vapour Deposition

被引:10
作者
Qin Xiu-Juan [1 ,2 ]
Han Si-Hui-Zhi [1 ]
Zhao Lin [1 ]
Zuo Hua-Tong [1 ]
Song Shi-Tao [3 ]
机构
[1] Yanshan Univ, Coll Environm & Chem Engn, Qinhuangdao 066004, Peoples R China
[2] State Key Lab Metastable Mat Sci & Technol, Qinhuangdao 066004, Peoples R China
[3] Hebei Normal Univ Sci & Technol, Coll Phys & Chem, Qinhuangdao 066004, Peoples R China
关键词
aerosol; chemical vapour deposition; Al-doped ZnO; transparent conductive thin films; OPTICAL-PROPERTIES;
D O I
10.3724/SP.J.1077.2011.00607
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Al-doped ZnO thin films were prepared by aerosol-assisted chemical vapour deposition (AACVD) on glass substrates. The effect of Al content (2at%-8at%) on the structural, optical and electrical properties of Al-doped ZnO thin films was investigated in detail. The samples were tested by XRD, SEM, EDAX and UV-Vis spectrophotometer. The results indicate that the AZO films have a hexagonal (wurtzite) structure without preferential orientation along c-axis, and however no Al related phases are observed. The average transmittances of the AZO film is over 72% in the visible regions. The optical band gap for the AZO films becomes narrow with the increasing Al dopant. The four-point probe technique is used to characterize thin films electrically. The data shows that Al dopant decrease the sheet resistance. The ZnO films doped with 6at% Al exhibit a minimum of sheet resistance (18 Omega/square).
引用
收藏
页码:607 / 612
页数:6
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