Nanofabrication using computer-assisted design and automated vector-scanning probe lithography

被引：27
作者：
Cruchon-Dupeyrat, S
Porthun, S
Liu, GY [1 ]
机构：
[1] Wayne State Univ, Dept Chem, Detroit, MI 48202 USA
[2] RHK Technol Inc, Troy, MI 48083 USA
来源：
APPLIED SURFACE SCIENCE | 2001年 / 175卷
基金：
美国国家科学基金会;
关键词：
nanofabrication; automated scanning probe lithography; atomic force microscopy; nanografting; self-assembled monolayers;
D O I：
10.1016/S0169-4332(01)00076-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
This work represents our initial effort towards the fabrication of complex nanopatterns with automated scanning probe lithography (SPL). A multi-mode scanning probe microscope is linked with a computer-controlled vector-scan module to allow precise, automated control of the tip motion. The module is interfaced with computer-assisted design (CAD) and VLSI software, and programming capabilities are developed. We also provide a pathway for integration of our apparatus with external instruments. The capability to rapidly produce complicated nanopatterns is demonstrated using AFM fabrication of thiol self-assembled monolayers. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：636 / 642
页数：7
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