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Thickness Optimization Simulation to Minimize Effective Reflectance in Broadband for SiO2/TiO2 Anti-Reflection Coating on Silicon Solar Cells
被引:0
|作者:
Kim, Jong-Chol
[1
]
Ri, Yun
[1
]
Pak, Un-Song
[2
]
Kim, Kyong-Chol
[3
]
Kwon, Hyok-Chang
[4
]
机构:
[1] Natl Acad Sci, Inst Silicate Engn, Pyongyang, North Korea
[2] Pyongyang Transportat Univ, Pyongyang, North Korea
[3] Kim Chaek Univ Technol, Fac Appl Chem Engn, Pyongyang, North Korea
[4] Natl Acad Sci, Inst Intelligent Informat Technol, Pyongyang, North Korea
关键词:
silicon solar cell;
FDTD;
neural network;
effective reflectance;
TIO2;
LAYERS;
FILMS;
D O I:
10.12693/APhysPolA.141.557
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
By the finite-difference time-domain method, we modeled the reflection coefficient with the ratios of the layer thicknesses of SiO2/TiO2. SiO2 /TiO2 thin film thickness ratios that minimize the effective reflectance in the broadband of 400-800 nm were simulated using an artificial neural network. For the Si/SiO2/TiO2 system, the results were obtained with the following layer parameters: n(Si) = 3:7-5.6, n(TiO2) = 2:3-2.7, d(TiO2) = 25 nm, and n(SiO2) = 1:5, d(SiO2) = 24 nm. The average effective reflectance coefficient in the broadband of 400-800 nm was about 6.6%. Accordingly, the optimization of the thickness parameters of the anti-reflection film has shown that it is possible to significantly reduce the total effective reflectance in the visible range, thereby increasing the efficiency of the solar cells.
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页码:557 / 560
页数:4
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