Waveguides in three-dimensional photonic-bandgap materials by direct laser writing and silicon double inversion

被引：41

作者：

Staude, I. ^{[1
,2
]}

von Freymann, G. ^{[1
,2
,3
]}

Essig, S. ^{[2
,4
]}

Busch, K. ^{[2
,4
]}

Wegener, M. ^{[1
,2
]}

机构：

[1] KIT, Inst Angew Phys, D-76128 Karlsruhe, Germany

[2] KIT, DFG Ctr Funct Nanostruct CFN, D-76128 Karlsruhe, Germany

[3] KIT, Inst Nanotechnol, D-76021 Karlsruhe, Germany

[4] KIT, Inst Theoret Festkorperphys, D-76128 Karlsruhe, Germany

来源：

OPTICS LETTERS | 2011年 / 36卷 / 01期

关键词：

LIGHT-EMISSION; CRYSTALS; WAVELENGTHS; FORMULATION; GRATINGS;

D O I：

10.1364/OL.36.000067

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Three-dimensional complete photonic-bandgap materials offer unique opportunities regarding the integration of optical waveguide architectures in three dimensions. However, corresponding experimental realizations are truly sparse. Here, we fabricate such waveguides using direct laser writing and a silicon double-inversion procedure. The optical characterization is in good agreement with theoretical calculations, raising hopes that even more complex architectures may soon come into reach. (C) 2010 Optical Society of America

引用

页码：67 / 69

页数：3

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