Characterization of an oxygen plasma by using a Langmuir probe in an inductively coupled plasma

被引:0
作者
Kim, JS [1 ]
Kim, GH
Chung, TH
Yeom, GY
Kwon, KH
机构
[1] Hanyang Univ, Dept Phys, Ansan 425795, South Korea
[2] Dong A Univ, Dept Phys, Pusan 604714, South Korea
[3] Sungkyunkwan Univ, Dept Mat Sci & Engn, Suwon 440746, South Korea
[4] Hanseo Univ, Dept Elect Engn, Seosan 356820, South Korea
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Oxygen plasmas were investigated by using a Langmuir probe for an inductively coupled plasma with various rf powers, 100 similar to 400 W, and operating pressures; 0.1 similar to 100 mTorr. The probe current ratio ct of the positive and negative currents (I-+(*)[I-e(*) + I--(*)]) increased with the generation of negative ions and had its maximum value in the;pressure region of 40 similar to 70 mTorr. Also, the operating pressure to achieve the maximum ct shifted from the low-pressure region to the high-pressure region with increasing input power because enhanced ion loss through positive-negative ion recombination.
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页码:259 / 263
页数:5
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