UV-Sintered Low-Temperature Solution-Processed SnO2 as Robust Electron Transport Layer for Efficient Planar Heterojunction Perovskite Solar Cells

被引:133
作者
Huang, Like [1 ]
Sun, Xiaoxiang [1 ]
Li, Chang [1 ]
Xu, Jie [2 ]
Xu, Rui [1 ]
Du, Yangyang [1 ]
Ni, Jian [1 ]
Cai, Hongkun [1 ]
Li, Juan [1 ]
Hu, Ziyang [2 ]
Zhang, Jianjun [1 ]
机构
[1] Nankai Univ, Coll Elect Informat & Opt Engn, Tianjin Key Lab Opt Elect Thin Film Devices & Tec, Tianjin 300071, Peoples R China
[2] Ningbo Univ, Dept Microelect Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
基金
中国国家自然科学基金;
关键词
tin dioxide; UV irradiation; low temperature processing electron transport layer; perovskite solar cells; HIGH-PERFORMANCE; PHOTOCHEMICAL ACTIVATION; OXYGEN VACANCIES; TIN OXIDE; TIO2; PHOTOLUMINESCENCE; GROWTH; FILMS; NANOPARTICLES; COVERAGE;
D O I
10.1021/acsami.7b04392
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Recently, low temperature solution-processed tin oxide (SnO2) as a versatile electron transport layer (ETL) for efficient and robust planar heterojunction (PH) perovskite solar cells (PSCs) has attracted particular attention due to its outstanding properties such as high optical transparency, high electron mobility, and suitable band alignment. However, for most of the reported works, an annealing temperature of 180 degrees C is generally required. This temperature is reluctantly considered to be a low temperature, especially with respect to the flexible application where 180 degrees C is still too high for the polyethylene terephthalate flexible substrate to bear. In this contribution, low temperature (about 70 degrees C) UV/ozone treatment was applied to in situ synthesis of SnO2 films deposited on the fluorine-doped tin oxide substrate as ETL. This method is a facile photochemical treatment which is simple to operate and can easily eliminate the organic components. Accordingly, PH PSCs with UV-sintered SnO2 films as ETL were successfully fabricated for the first time. The device exhibited excellent photovoltaic performance as high as 16.21%, which is even higher than the value (11.49%) reported for a counterpart device with solution-processed and high temperature annealed SnO2 films as ETL. These low temperature solution-processed and UV-sintered SnO2 films are suitable for the low-cost, large yield solution process on a flexible substrate for optoelectronic devices.
引用
收藏
页码:21909 / 21920
页数:12
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