The hillock formation in a Cu/Sn-9Zn/Cu lamella upon current stressing

被引:14
作者
Kuo, Shih-Ming [1 ]
Lin, Kwang-Lung [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
关键词
electromigration; hillock;
D O I
10.1007/s11664-007-0209-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electromigration (EM) that occurs in a Cu/Sn-9Zn/Cu lamella was investigated for hillock formation at room temperature with a current density of 10(3) A/cm(2) for up to 230 h. Hillocks and cavities grew in the middle of the bulk solder and at the cathode, respectively. The formation of hillocks was ascribed to a compressive stress resulting from the diffusion of Sn atoms driven by electromigration and Cu-Zn compound formation.
引用
收藏
页码:1378 / 1382
页数:5
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