Resolution enhancement by applying MFM under UHV conditions

被引：6

作者：

Dreyer, M ^{[1
]}

Gomez, RD ^{[1
]}

Mayergoyz, ID ^{[1
]}

机构：

[1] Lab Phys Sci, College Pk, MD 20740 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2000年 / 36卷 / 05期

关键词：

magnetic force microscopy; resolution; UHV;

D O I：

10.1109/20.908645

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The enhancement in signal-to-noise ratio and lateral resolution in MFM in going from ambient pressure to UHV is demonstrated. The performance of several cantilevers is evaluated using a patterned 50 nm thick permalloy film, with cross-tie as well as similar to 90 degrees domain walls, and a 200 nm thick permalloy film with perpendicular magnetization, The increase in the quality factor of the cantilever oscillation in UHV improves the sensitivity, consequently allowing less magnetic material on the tip to achieve the same signal-to-noise ratio. This reduction in magnetic volume sharpens the lateral resolution. We also demonstrate that the magnetic interaction can be so weak that a magnetic contrast is visible only under UHV conditions.

引用

页码：2975 / 2977

页数：3