Large deflection micromechanical scanning mirrors for linear scans and pattern generation

被引:170
作者
Schenk, H [1 ]
Dürr, P
Haase, T
Kunze, D
Sobe, U
Lakner, H
Kück, H
机构
[1] Fraunhofer Inst Microelect Circuits & Syst, D-01109 Dresden, Germany
[2] Univ Stuttgart, IZFM, D-70174 Stuttgart, Germany
关键词
deep silicon etch; filled trench; light deflection; mechanical stability; micromirror; pattern generation;
D O I
10.1109/2944.892609
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An electrostatically driven silicon micro scanning mirror (MSM) for one-dimensional (1-D) and two-dimensional (2-D) deflection of fight is presented. A special configuration of the driving electrodes allows the use of small electrode gaps without restricting the deflection of the plate geometrically, In this paper, the starting of the oscillation and the operation of the scanner is discussed. Experimental results show that scan angles of up to 60 degrees can be achieved at a driving voltage of only 20 V, The 2-D deflection of a laser beam is obtained by a gimbal mounting of the mirror plate. For the fabrication of the devices, SOI-wafers are used as the base material, The mechanical structures are defined by a deep silicon etch, For the electrical isolation of areas on the movable frame, polysilicon-filled trenches are used. The mechanical stability of the scanners is tested. The devices resist shocks of more than 1000 g and show no change of the resonance frequency even after long run tests of 7 x 10(9) periods.
引用
收藏
页码:715 / 722
页数:8
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