Experimental determination of interfacial-layer thickness from polarization-voltage hysteresis loops in Pb(Zr0.4Ti0.6)O3 thin films -: art. no. 202904

被引:17
作者
Jiang, AQ [1 ]
Wang, C [1 ]
Cheng, BL [1 ]
Chen, ZH [1 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
关键词
D O I
10.1063/1.1927270
中图分类号
O59 [应用物理学];
学科分类号
摘要
Interfacial layers near top and bottom electrodes with low resistivity in Pb(Zr0.4Ti0.6)O-3 (PZT) thin film are identified and modeled through frequency-dependent polarization-voltage (P-V) hysteresis loops at frequencies below 20 kHz. Actual voltage drops, as well as built-in imprint voltage across the intrinsic ferroelectric layer, are found to be frequency dependent, as shown from the linear voltage shift of P-V hysteresis loops against applied external voltage at different frequencies with respect to one referenced hysteresis loop. Calculated interfacial-layer thickness is about 32 +/- 2 nm for an Ir/IrO2/PZT/Pt/SiO2/Si capacitor with a PZT film thickness of 100 nm, in good agreement with the resistive measurements by Chu et al. [Appl. Phys. Lett. 81, 5204 (2002)]. (c) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
相关论文
共 10 条
[1]   FERROELECTRIC SCHOTTKY DIODE [J].
BLOM, PWM ;
WOLF, RM ;
CILLESSEN, JFM ;
KRIJN, MPCM .
PHYSICAL REVIEW LETTERS, 1994, 73 (15) :2107-2110
[2]   Thickness of the near-interface regions and central bulk ohmic resistivity in lead lanthanum zirconate titanate ferroelectric thin films [J].
Chu, DP ;
Zhang, ZG ;
Migliorato, P ;
McGregor, BM ;
Ohashi, K ;
Hasegawa, K ;
Shimoda, T .
APPLIED PHYSICS LETTERS, 2002, 81 (27) :5204-5206
[3]   Thickness dependence of the switching voltage in all-oxide ferroelectric thin-film capacitors prepared by pulsed laser deposition [J].
Cillessen, JFM ;
Prins, MWJ ;
Wolf, RM .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (06) :2777-2783
[4]   The interface screening model as origin of imprint in PbZrxTi1-xO3 thin films.: II.: Numerical simulation and verification [J].
Grossmann, M ;
Lohse, O ;
Bolten, D ;
Boettger, U ;
Waser, R .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (05) :2688-2696
[5]   A THEORY OF D-E HYSTERESIS LOOP - APPLICATION OF AVRAMI MODEL [J].
ISHIBASHI, Y ;
ORIHARA, H .
INTEGRATED FERROELECTRICS, 1995, 9 (1-3) :57-61
[6]   Enhanced retention characteristics of Pb(Zr, Ti)O3 capacitors by ozone treatment [J].
Lee, KM ;
An, HG ;
Lee, JK ;
Lee, YT ;
Lee, SW ;
Joo, SH ;
Nam, SD ;
Park, KS ;
Lee, MS ;
Park, SO ;
Kang, HK ;
Moon, JT .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (08) :4979-4983
[7]   Relaxation mechanism of ferroelectric switching in Pb(Zr,Ti)O3 thin films [J].
Lohse, O ;
Grossmann, M ;
Boettger, U ;
Bolten, D ;
Waser, R .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (04) :2332-2336
[8]  
Scott J. F., 2000, FERROELECTRIC MEMORI
[9]   SWITCHING KINETICS OF LEAD ZIRCONATE TITANATE SUB-MICRON THIN-FILM MEMORIES [J].
SCOTT, JF ;
KAMMERDINER, L ;
PARRIS, M ;
TRAYNOR, S ;
OTTENBACHER, V ;
SHAWABKEH, A ;
OLIVER, WF .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (02) :787-792
[10]   Driving force behind voltage shifts in ferroelectric materials [J].
Warren, WL ;
AlShareef, HN ;
Dimos, D ;
Tuttle, BA ;
Pike, GE .
APPLIED PHYSICS LETTERS, 1996, 68 (12) :1681-1683