Characterization of Sputtered Zirconium Nitride Thin Films Deposited at Various RF Power and Sputtering Pressure

被引：2

作者：

Patel, Harsh, V ^{[1
]}

Patel, Harsh N. ^{[1
]}

Soni, Pratik A. ^{[1
]}

Parmar, Hemit D. ^{[1
]}

Patel, Nicky P. ^{[1
,2
]}

Chauhan, Kamlesh, V ^{[2
]}

机构：

[1] Sardar Patel Coll Engn, Dept Mech Engn, Bakrol 388315, Gujarat, India

[2] Charotar Univ Sci & Technol CHARUSAT, CHAMOS Matrusanstha Dept Mech Engn, CSPIT, Changa 388421, Gujarat, India

来源：

PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS (ICAM 2019) | 2019年 / 2162卷

关键词：

D O I：

10.1063/1.5130303

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Zirconium Nitride coatings was developed by magnetron sputtering in the environment of argon as inert gas and nitrogen as reactive gas. In this work study the effect of sputtering power and working pressure on various properties like structural, optical and wettability of zirconium nitride coatings are reported. X-Ray diffraction was used to study the structural properties of Zirconium nitride coating which showed (321) peak of Zr3N4 which was consistent with all the samples prepared. Surface morphology was studied using SEM which showed that the deposited coatings had columnar structure. Optical properties studied using UV-Vis-NIR spectrophotometer showed that the films deposited were transparent and showed a maximum transmittance of 75%. The wettability properties observed using contact angle goniometer showed a maximum of 107(0) and minimum of 980 contact angle which depicts that the coating deposited were hydrophobic.

引用

页数：5

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