Bipolar resistive switching in Cu/AlN/Pt nonvolatile memory device

被引:161
作者
Chen, C. [1 ]
Yang, Y. C. [1 ]
Zeng, F. [1 ]
Pan, F. [1 ]
机构
[1] Tsinghua Univ, Dept Mat Sci & Engn, Adv Mat Lab, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
aluminium compounds; copper; III-V semiconductors; platinum; random-access storage; semiconductor storage;
D O I
10.1063/1.3483158
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly stable and reproducible bipolar resistive switching effects are reported on Cu/AlN/Pt devices. Memory characteristics including large memory window of 10(3), long retention time of >10(6) s and good endurance of >10(3) were demonstrated. It is concluded that the reset current decreases as compliance current decreases, which provides an approach to suppress power consumption. The dominant conduction mechanisms of low resistance state and high resistance state were verified by Ohmic behavior and trap-controlled space charge limited current, respectively. The memory effect is explained by the model concerning redox reaction mediated formation and rupture of the conducting filament in AlN films. (C) 2010 American Institute of Physics. [doi:10.1063/1.3483158]
引用
收藏
页数:3
相关论文
共 19 条
  • [1] [Anonymous], CURRENT INJECTION SO
  • [2] Resistive switching characteristics in Pr0.7Ca0.3MnO3 thin films on LaNiO3-electrodized Si substrate
    Chang, Wen-Yuan
    Liao, Jeng-Hwa
    Lo, Yun-Shan
    Wu, Tai-Bor
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (17)
  • [3] Bipolar resistance switching characteristics in a thin Ti-Ni-O compound film
    Choi, Joonhyuk
    Song, JaeHoon
    Jung, Kyooho
    Kim, Yongmin
    Im, Hyunsik
    Jung, Woong
    Kim, Hyungsang
    Do, Young Ho
    Kwak, June Sik
    Hong, Jinpyo
    [J]. NANOTECHNOLOGY, 2009, 20 (17)
  • [4] Al electrode dependent transition to bipolar resistive switching characteristics in pure TiO2 films
    Do, Young Ho
    Kwak, June Sik
    Hong, Jin Pyo
    Jung, Kyooho
    Im, Hyunsik
    [J]. JOURNAL OF APPLIED PHYSICS, 2008, 104 (11)
  • [5] Spectroellipsometric investigation of optical, morphological, and structural properties of reactively sputtered polycrystalline AlN films
    Easwarakhanthan, T.
    Hussain, S. S.
    Pigeat, P.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (03): : 495 - 501
  • [6] CMOS compatible nanoscale nonvolatile resistance, switching memory
    Jo, Sung Hyun
    Lu, Wei
    [J]. NANO LETTERS, 2008, 8 (02) : 392 - 397
  • [7] Temperature dependence of high- and low-resistance bistable states in polycrystalline NiO films
    Jung, Kyooho
    Seo, Hongwoo
    Kim, Yongmin
    Im, Hyunsik
    Hong, JinPyo
    Park, Jae-Wan
    Lee, Jeon-Kook
    [J]. APPLIED PHYSICS LETTERS, 2007, 90 (05)
  • [8] Kwon DH, 2010, NAT NANOTECHNOL, V5, P148, DOI [10.1038/NNANO.2009.456, 10.1038/nnano.2009.456]
  • [9] Two series oxide resistors applicable to high speed and high density nonvolatile memory
    Lee, Myoung-Jae
    Park, Youngsoo
    Suh, Dong-Seok
    Lee, Eun-Hong
    Seo, Sunae
    Kim, Dong-Chirl
    Jung, Ranju
    Kang, Bo-Soo
    Ahn, Seung-Eon
    Lee, Chang Bum
    Seo, David H.
    Cha, Young-Kwan
    Yoo, In-Kyeong
    Kim, Jin-Soo
    Park, Bae Ho
    [J]. ADVANCED MATERIALS, 2007, 19 (22) : 3919 - +
  • [10] Multilevel resistive switching with ionic and metallic filaments
    Liu, Ming
    Abid, Z.
    Wang, Wei
    He, Xiaoli
    Liu, Qi
    Guan, Weihua
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (23)