Electrostatic Discharge Performance of GaN-Based Light Emitting Diodes with Naturally Textured p-GaN Layers Grown on Vicinal Sapphires

被引:0
作者
Liu, Yi-Jung [1 ]
Tsai, Tsung-Yuan [1 ]
Yen, Chih-Hung [1 ]
Chen, Li-Yang [1 ]
Tsai, Tsung-Han [1 ]
Huang, Chien-Chang [1 ]
Chen, Tai-You [1 ]
Hsu, Chi-Shiang [1 ]
Liu, Wen-Chau [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 70101, Taiwan
关键词
ESD CHARACTERISTICS; FILMS; MISORIENTATION; SUBSTRATE; LEDS;
D O I
10.1149/1.3486448
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrostatic discharge (ESD) characteristics of GaN-based light emitting diodes (LEDs) with textured p-GaN layers grown on c-axis vicinal sapphire substrates are studied and demonstrated. Based on the machine model, the device grown on a 0.35 degrees tilt sapphire shows the highest ESD tolerance, whereas the one grown on a 0.2 degrees tilt sapphire exhibits the poorest tolerance. This phenomenon is primarily influenced by the presence of maximum capacitance (C-m) values induced by a parasitic capacitance effect at the p-GaN/indium tin oxide interface rather than the difference in dislocation densities between LEDs. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3486448] All rights reserved.
引用
收藏
页码:H406 / H408
页数:3
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