Mechanism of electrical polarization of silica glass

被引:36
作者
Doremus, RH [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
关键词
D O I
10.1063/1.2140090
中图分类号
O59 [应用物理学];
学科分类号
摘要
When an electrical potential is applied to silica glass at 250 degrees C, there is a residual electrical field after the applied potential is removed. The profile of this field with distance is modeled as resulting from interdiffusion of sodium and hydronium ions; the shapes of the measured and calculated profiles of electrical field agree reasonably well, showing that this model describes the mechanism of poling the glass. (c) 2005 American Institute of Physics.
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页码:1 / 2
页数:2
相关论文
共 15 条
[1]   ANALYSIS OF FIELD-ASSISTED BINARY ION-EXCHANGE [J].
ABOUELLEIL, M ;
COOPER, AR .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1979, 62 (7-8) :390-395
[2]  
DOREMUS RH, 1969, PHYS CHEM GLASSES, V10, P28
[3]   EXCHANGE + DIFFUSION OF IONS IN GLASS [J].
DOREMUS, RH .
JOURNAL OF PHYSICAL CHEMISTRY, 1964, 68 (08) :2212-&
[4]  
DOREMUS RH, 1994, GLASS SCI, pCH11
[5]  
DOREMUS RH, 1989, J AM CERAM SOC, V67, P476
[6]   SODIUM DIFFUSION IN SIO2 GLASS [J].
FRISCHAT, GH .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1968, 51 (09) :528-+
[7]  
HETHERINGTON G, 1965, PHYS CHEM GLASSES, V6, P6
[8]  
KANEKO T, 1974, 10TH P INT C GLASS K, P8
[9]   ELECTRODE POLARIZATION OF GLASSES [J].
KIM, C ;
TOMOZAWA, M .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1976, 59 (3-4) :127-130
[10]   Etching of silica glass under electric fields [J].
Lesche, B ;
Garcia, FC ;
Hering, EN ;
Margulis, W ;
Carvalho, ICS ;
Laurell, F .
PHYSICAL REVIEW LETTERS, 1997, 78 (11) :2172-2175