Bulk and surface electronic states in the dosed semimetallic HfTe2

被引:9
作者
El Youbi, Zakariae [1 ,2 ]
Jung, Sung Won [1 ]
Mukherjee, Saumya [1 ,3 ]
Fanciulli, Mauro [2 ,4 ]
Schusser, Jakub [2 ,5 ]
Heckmann, Olivier [2 ,4 ]
Richter, Christine [2 ,4 ]
Minar, Jan [5 ]
Hricovini, Karol [2 ,4 ]
Watson, Matthew D. [1 ]
Cacho, Cephise [1 ]
机构
[1] Diamond Light Source, Harwell Campus, Didcot OX11 0DE, Oxon, England
[2] CY Cergy Paris Univ, Lab Phys Mat & Surfaces, 5 Mail Gay Lussac, F-95031 Cergy Pontoise, France
[3] Univ Oxford, Dept Phys, Clarendon Lab, Parks Rd, Oxford OX1 3PU, England
[4] Univ Paris Saclay, CEA, CNRS, LIDYL, F-91191 Gif Sur Yvette, France
[5] Univ West Bohemia, New Technol Res Ctr, Plzen 30614, Czech Republic
基金
瑞士国家科学基金会; 欧盟地平线“2020”;
关键词
BAND-GAP; TRANSITION; PHASE;
D O I
10.1103/PhysRevB.101.235431
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The dosing of layered materials with alkali metals has become a commonly used strategy in ARPES experiments. However, precisely what occurs under such conditions, both structurally and electronically, has remained a matter of debate. Here we perform a systematic study of 1T-HfTe2, a prototypical semimetal of the transition metal dichalcogenide family. By utilizing photon energy-dependent angle-resolved photoemission spectroscopy (ARPES), we have investigated the electronic structure of this material as a function of potassium (K) deposition. From the k(z), maps, we observe the appearance of 2D dispersive bands after electron dosing, with an increasing sharpness of the bands, consistent with the wave-function confinement at the topmost layer. In our highest-dosing cases, a monolayerlike electronic structure emerges, presumably as a result of intercalation of the alkali metal. Here, by bringing the topmost valence band below E-F, we can directly measure a band overlap of similar to 0.2 eV. However, 3D bulklike states still contribute to the spectra even after considerable dosing. Our work provides a reference point for the increasingly popular studies of the alkali metal dosing of semimetals using ARPES.
引用
收藏
页数:8
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