Effect of Low-Energy Ion-Plasma Treatment on Residual Stresses in Thin Chromium Films

被引：4

作者：

Babushkin, A. S. ^{[1
]}

Uvarov, I. V. ^{[1
]}

Amirov, I. I. ^{[1
]}

机构：

[1] Russian Acad Sci, Yaroslavl Branch, Inst Phys & Technol, Yaroslavl 150007, Russia

来源：

TECHNICAL PHYSICS | 2018年 / 63卷 / 12期

关键词：

IN-SITU MEASUREMENT; SURFACE STRESS; MECHANICAL-PROPERTIES; MORPHOLOGY; EVOLUTION; CU;

D O I：

10.1134/S1063784218120228

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The results of studying the effect of low-energy argon ion bombardment (similar to 30 eV) on residual mechanical stresses in a thin chromium film are presented. The change in the mean value and stress gradient as a function of the ion bombardment duration was determined by the change in the bend of test micromechanical bridges and cantilevers. A method is proposed for calculating the depth of the stress modification in a film using these structures. It has been established that the long-term ion-plasma treatment at room temperature affects stresses at a depth of more than 100 nm.

引用

页码：1800 / 1807

页数：8

共 35 条

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