Impact of NBTI on the temporal performance degradation of digital circuits

被引:186
作者
Paul, BC [1 ]
Kang, K [1 ]
Kufluoglu, H [1 ]
Alam, MA [1 ]
Roy, K [1 ]
机构
[1] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA
关键词
negative bias temperature instability (NBTI); performance degradation; threshold voltage degradation;
D O I
10.1109/LED.2005.852523
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Negative bias temperature instability (NBTI) has become one of the major causes for reliability degradation of nanoscale circuits. In this letter, we propose a simple analytical model to predict the delay degradation of a wide class of digital logic gate based on both worst case and activity dependent threshold voltage change under NBTI. We show that by knowing the threshold voltage degradation of a single transistor due to NBTI, one can predict the performance degradation of a circuit with a reasonable degree of accuracy. We find that digital circuits are much less sensitive (approximately 9.2% performance degradation in ten years for 70 nm technology) to NBTI degradation than previously anticipated.
引用
收藏
页码:560 / 562
页数:3
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