Development of high strength reaction-sintered silicon carbide

被引:15
|
作者
Suyama, S
Itoh, Y
Kohyama, A
Katoh, Y
机构
[1] Toshiba Co Ltd, Power & Ind Syst Res & Dev Ctr, Kawasaki Ku, Kawasaki, Kanagawa 2100862, Japan
[2] Toshiba Co Ltd, Power & Ind Syst Res & Dev Ctr, Tsurumi Ku, Yokohama, Kanagawa 2300045, Japan
[3] Kyoto Univ, Inst Adv Energy, Uji 6110011, Japan
关键词
reaction sintering; residual silicon; composition; microstructure; bending strength;
D O I
10.2109/jcersj.109.1268_315
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In reaction-sintered silicon carbides, usually 10-40 vol% of the residual silicon phase remains after the reaction-sintered process. For this reason, the bending strength of reaction-sintered silicon carbides decreases to or below 300 MPa. The raw material composition (C/SiC) and the starting particle size were optimized in order to decrease the volume fraction of residual silicon and the SiC grain size. There was a tendency for the strength to increase with decreasing, the residual silicon size. The strengthening effect may be attributed to the reduced residual silicon size. A reaction-sintered silicon carbide with a high bending strength of 1000 MPa could be developed by the present optimization method.
引用
收藏
页码:315 / 321
页数:7
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