The effects of substrate compositions on adhesion of diamond films deposited on Fe-base alloys

被引:39
作者
Li, Y. S. [1 ]
Hirose, A. [1 ]
机构
[1] Univ Saskatchewan, Plasma Phys Lab, Saskatoon, SK S7N 5E2, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
alloy; diamond; plasma CVD; adhesion; Raman scattering spectroscopy;
D O I
10.1016/j.surfcoat.2007.05.037
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Diamond deposition on a series of ferrous alloy substrates has been examined in a microwave plasma enhanced chemical vapor deposition reactor. The results show that the nucleation, growth, and adhesion properties of the diamond are strongly dependent on the types and relative concentrations of the alloy elements in the substrates. Along with high nucleation densities, continuous and adherent diamond films have been successfully fabricated on the Al-modified alloy substrates, even in the absence of inter-layers or nucleation enhancing surface pre-treatment. The mechanism is preliminarily clarified regarding the delicate competition and balance between the base metal and the alloying elements in terms of their activation and deactivation ability on catalyzing graphite formation during deposition process. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:280 / 287
页数:8
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