Fast non-contact surface roughness measurements up to the micrometer range by dual-wavelength digital holographic microscopy

被引:1
|
作者
Kuehn, Jonas [1 ]
Solanas, Eduardo [2 ]
Bourquin, Sebastien [2 ]
Blaser, Jean-Francois [3 ]
Dorigatti, Luca [3 ]
Keist, Thierry [3 ]
Emery, Yves [2 ]
Depeursinge, Christian [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Appl Photon Lab LOA, CH-1015 Lausanne, Switzerland
[2] Lyncee Tec SA, CH-1015 Lausanne, Switzerland
[3] Trimos SA, CH-1020 Renens, Switzerland
来源
OPTICAL MICRO- AND NANOMETROLOGY III | 2010年 / 7718卷
关键词
Surface roughness; surface metrology; digital holography; phase imaging; interferometry; microscopy; NUMERICAL RECONSTRUCTION; CLASSIFICATION;
D O I
10.1117/12.854550
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present fast high-roughness and non-contact surface measurements by digital holographic microscopy (DHM). By using single-and dual-wavelength operation modes, coupled with advanced image stitching and non-measured points management methods, the technique enables two-dimensional roughness measurements up to the micrometer (N6). The sample is mechanically scanned over a surface up to 5 x 0.3 mm(2) with 17 holograms each acquired in less than 500 mu s, the corresponding phase images stitched together by software, and therefore providing multiple profiles measurement in the ISO definition in less than 30 s. The approach is validated by inspection of several different roughness standards and our technique is demonstrated to be in agreement with two existing well-known techniques in the field.
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页数:8
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