Automatic mask adaptation of CMOS-compatible micromachined devices using their finite element model

被引：0

作者：

Lang, M ^{[1
]}

Glesner, M ^{[1
]}

机构：

[1] Tech Univ Darmstadt, Inst Microelect Syst, D-64287 Darmstadt, Germany

来源：

JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 1998年 / 8卷 / 02期

关键词：

D O I：

10.1088/0960-1317/8/2/031

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reports on an extension of a FEM-to-layout converter which gives the designer of microsystems the opportunity to adapt existing microsystems on the structural level towards personal requirements. This tool enables the designer to change the properties of such microsystems on the level of a finite element model. After the accomplishment of the changes, the corresponding masks of these devices are adapted automatically on the layout level, so that it is not necessary for the designer to have knowledge of the specific layers which are necessary to fabricate these devices and, therefore, have to be adapted.

引用

页码：165 / 167

页数：3

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