Effect of etching on the laser-induced damage properties of artificial defects under 1064-nm laser irradiation

被引：16

作者：

Lu, Menglei ^{[1
,2
]}

Ma, Bin ^{[1
,2
]}

Zhan, Guangda ^{[1
,2
]}

Jiao, Hongfei ^{[1
,2
]}

Cheng, Xinbin ^{[1
,2
]}

机构：

[1] Minist Educ, Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China

[2] Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Shanghai 200092, Peoples R China

来源：

OPTICAL ENGINEERING | 2014年 / 53卷 / 12期

基金：

中国国家自然科学基金;

关键词：

laser-induced damage threshold; chemical etching; indentation; metal nanoparticles; damage morphology; FUSED-SILICA; SUBSURFACE DAMAGE; RESISTANCE; SURFACES;

D O I：

10.1117/1.OE.53.12.122505

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The cracks and scratches inevitably generated by previous grinding and polishing significantly lower the ability of laser resistance of optical substrates. In this study, the artificial indentations, scratches, and structural defects imbedded with metal nanoparticles are fabricated. The laser-induced damage characteristics of such defects in different types and sizes are investigated qualitatively and quantitatively under 1064-nm laser irradiation. Moreover, the etching effect on improving the laser-induced damage threshold (LIDT) of artificial defects under different etching conditions is analyzed. LIDT is then evaluated according to the etching depth and the morphologies of artificial defects. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)

引用

页数：7

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