Bragg Grating Optical Filters by UV Nanoimprinting

被引：3

作者：

Casalboni, M. ^{[1
,2
]}

Dominici, L. ^{[3
,4
]}

Foglietti, V. ^{[5
]}

Michelotti, F. ^{[3
,4
]}

Orsini, E. ^{[1
,2
]}

Palazzesi, C. ^{[1
,2
]}

Stella, F. ^{[1
,2
]}

Prosposito, P. ^{[1
,2
]}

机构：

[1] Univ Roma Tor Vergata, Dept Phys, I-00133 Rome, Italy

[2] INSTM, I-00133 Rome, Italy

[3] Univ Roma La Sapienza, Dept Energet, I-00161 Rome, Italy

[4] CNISM, I-00161 Rome, Italy

[5] CNR, IFN, Inst Photon & Nanotechnol, I-00156 Rome, Italy

来源：

JOURNAL OF NANOMATERIALS | 2012年 / 2012卷

关键词：

LITHOGRAPHY; REPLICATION; FABRICATION;

D O I：

10.1155/2012/186429

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Results on an optical waveguide filter operating in the near IR region are reported. The device consists of a hybrid sol-gel -based grating loaded waveguide, obtained through the merging of conventional photolithography and UV-nanoimprinting. Starting from submicrometric gratings, fabricated by electron beam lithography, a softmould has been produced and the original structures were replicated onto sol-gel photosensitive films. A final photolithographic step allowed the production of grating-loaded channel waveguides. The devices were optically characterized by transmission measurements in the telecom range 1450-1590 nm. The filter extinction ratio is -11 dB and the bandwidth is 1.7 nm.

引用

页数：5

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