X-ray Photoelectron Spectroscopy Study of Interfacial Reactions between Metal and Ultrathin Ge Oxide

被引：21

作者：

Ohta, Akio ^{[1
]}

Fujioka, Tomohiro ^{[1
]}

Murakami, Hideki ^{[1
]}

Higashi, Seiichiro ^{[1
]}

Miyazaki, Seiichi ^{[2
]}

机构：

[1] Hiroshima Univ, Dept Semicond Elect & Integrat Sci, Grad Sch Adv Sci Matter, Hiroshima 7398530, Japan

[2] Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2011年 / 50卷 / 10期

关键词：

GERMANIUM; POSITION; SURFACE; GE(111); STATES;

D O I：

10.1143/JJAP.50.10PE01

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

After evaporation of four different metal films (Al, Ti, Ni, and Au) on thermally-grown Ge oxide/Ge(100), the chemical bonding features in the region near the metal/oxide interfaces were investigated by high-resolution X-ray photoelectron spectroscopy (XPS). From the analysis of coreline spectra, we found that a part of thermally-grown GeO2 was reduced with Ni, Ti, and Al evaporation. The reduction of GeO2 layer becomes insignificant in the increasing order of metal oxide formation energy metals as predicted from the calculation of Gibbs free energy change in each metal oxidation. For Al that is mostly reactive with GeO2, not only the oxygen transfer from GeO2 to Al, but also the formation of Al-Ge bonds in the region near the Al/GeO2 interface occurs with Al evaporation on thermally grown GeO2. (C) 2011 The Japan Society of Applied Physics

引用

页数：6

共 29 条

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