X-ray emission from femtosecond laser micromachining

被引：18
作者：
Thogersen, J
Borowiec, A
Haugen, HK
McNeill, FE
Stronach, IM
机构：
[1] McMaster Univ, Blackhouse Inst Mat Res, Hamilton, ON L8S 4M1, Canada
[2] McMaster Univ, Dept Phys & Astron, Med Phys & Radiat Sci Unit, Hamilton, ON L8S 4M1, Canada
[3] Aarhus Univ, Dept Chem, DK-8000 Aarhus, Denmark
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2001年 / 73卷 / 03期
关键词：
D O I：
10.1007/s003390100741
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We characterize the spectral properties of X-rays generated from selected metal and semiconductor targets when 120-fs laser pulses are focused to intensities of similar to 10(14)-3 x 10(15) W/cm(2) during laser micromachining in air. High fluxes of multi-keV-energy X-rays could be obtained with 280-muJ pulses at a 1 kHz repetition rate. The yield and spectral composition of the X-rays are found to depend sensitively on the processing conditions, and thus the X-ray emission is expected to be a novel indicator of optimal laser machining.
引用
收藏
页码：361 / 363
页数：3
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