Utilizing a photosensitive dry film resist in proton beam writing

被引：2

作者：

Seki, Hironori ^{[1
]}

Kawamura, Keiya ^{[1
]}

Hayashi, Hidetaka ^{[2
]}

Ishii, Yasuyuki ^{[3
]}

Puttaraksa, Nitipon ^{[4
,5
]}

Nishikawa, Hiroyuki ^{[1
]}

机构：

[1] Shibaura Inst Technol, Koto Ku, 3-7-5 Toyosu, Tokyo 1358548, Japan

[2] NPO Ecodesign Promot Network, Bunkyo Ku, Yayoi 2-11-16, Tokyo 1138656, Japan

[3] Takasaki Adv Radiat Res Inst, 1233 Watanukimachi, Takasaki, Gumma 3701292, Japan

[4] King Mongkuts Univ Technol, Fac Sci, Nanosci & Nanotechnol Grad Res Program, 126 Prachautid Rd, Bangkok 10140, Thailand

[5] King Mongkuts Univ Technol, Fac Sci, Appl Sci & Engn Social Solut Unit, 126 Prachautid Rd, Bangkok 10140, Thailand

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2022年 / 61卷 / SD期

关键词：

proton beam writing; dry film resists; photosensitivity; MICROFLUIDIC DEVICES; PHOTORESIST; FABRICATION;

D O I：

10.35848/1347-4065/ac55e1

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Dry film resists (DFRs) are suitable for the fabrication of large volume devices as the thickness of the film can be easily controlled. Here, the DFR microstructures were patterned using the proton beam writing (PBW) technique by taking advantages of the direct-write process, straight trajectories of protons, and large processing depth. The results show that the required irradiation dose of 15 mu m DFR was 10 nC mm(-2) for 1 MeV protons. In summary, we have optimized the PBW conditions to create smooth surface micropatterns with a vertical wall in the DFR.

引用

页数：4

共 50 条

[21] Maskless proton beam writing in gallium arsenide
Mistry, P.
Gomez-Morilla, I.
Smith, R. C.
Thomson, D.
Grime, G. W.
Webb, R. P.
Gwilliam, R.
Jeynes, C.
Cansell, A.
Merchant, M.
Kirkby, K. J.
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2007, 260 (01) : 437 - 441
[22] New developments in the applications of proton beam writing
Mistry, P
Gomez-Morilla, I
Grime, GW
Webb, RP
Gwilliam, R
Cansell, A
Merchant, M
Kirkby, KJ
Teo, EJ
Breese, MBH
Bettiol, AA
Blackwood, DJ
Watt, F
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 237 (1-2) : 188 - 192
[23] Proton beam writing of passive waveguides in PMMA
Sum, TC
Bettiol, AA
Seng, HL
Rajta, I
van Kan, JA
Watt, F
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 210 : 266 - 271
[24] Proton beam writing for producing holographic images
Ow, Y. S.
Breese, M. B. H.
Bettiol, A. A.
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (12-13) : 2289 - 2291
[25] Microprocessing of Arched Bridge Structures with Epoxy Resin by Proton Beam Writing
Takano, Katsuyoshi
Asano, Atsushi
Maeyoshi, Yuta
Marui, Hiromi
Omichi, Masaaki
Saeki, Akinori
Seki, Shu
Satoh, Takahiro
Ishii, Yasuyuki
Kamiya, Tomihiro
Koka, Masashi
Ohkubo, Takeru
Sugimoto, Masaki
Nishikawa, Hiroyuki
[J]. JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2012, 25 (01) : 43 - 46
[26] Enhancement of proton beam writing in PMMA through optimization of the development procedure
Bolhuis, S.
van Kan, J. A.
Watt, F.
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2009, 267 (12-13) : 2302 - 2305
[27] Application of dry film resist in the fabrication of microfluidic chips for droplet generation
Leech, P. W.
Wu, N.
Zhu, Y.
[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2009, 19 (06)
[28] Proton-beam writing of poly-methylmethacrylate buried channel waveguides
Sum, T. C.
Bettiol, A. A.
Florea, Catalin
Watt, E.
[J]. JOURNAL OF LIGHTWAVE TECHNOLOGY, 2006, 24 (10) : 3803 - 3809
[29] Enhancing proton beam writing system with auto scanning software and stage movement
Truong Phi Nguyen
Teshima, Ryo
Hasegawa, Tadahiro
Nishikawa, Hiroyuki
[J]. MICROELECTRONIC ENGINEERING, 2013, 102 : 12 - 17
[30] Micro-structuring of epoxy resists containing nanoparticles by proton beam writing
Sano, Ryo
Hayakawa, Simon
Hayashi, Hidetaka
Ishii, Yasuyuki
Nishikawa, Hiroyuki
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2017, 404 : 228 - 232

← 1 2 3 4 5 →