Contact Mechanics of a Thin Layer Pressed Onto a Substrate by a Line Load

被引:3
作者
Parel, K. S. [1 ]
机构
[1] Univ Oxford, Dept Engn Sci, Oxford OX1 3PJ, England
来源
JOURNAL OF APPLIED MECHANICS-TRANSACTIONS OF THE ASME | 2020年 / 87卷 / 04期
关键词
receding contact; distributed dislocation technique; contact mechanics; linear elasticity; thin layer; coulomb friction; elasticity; stress analysis; partial slip; FUNCTIONALLY GRADED LAYER; RECEDING CONTACT; ELASTIC LAYER; PLANE PROBLEM; HALF-PLANE;
D O I
10.1115/1.4045717
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
A fundamental plane frictional receding contact of a thin layer pressed onto a substrate is solved with the insertion of distributions of dislocations. The new formulation overcomes the restriction of standard contact analysis with the distributed dislocation technique, which requires the distributions to be square root bounded to zero or square root singular at the ends of the area of insertion. This new formulation opens up a range of plane frictional receding contacts to theoretical study. Solutions are obtained for the basic plane receding contact problem of a homogeneous linear elastic semi-infinite layer pressed by a line load onto a half-plane of the same material with a Coulomb friction interface. The frictional dependence of receding contact behavior is identified and discussed.
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页数:10
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