Photo-chemical degradation study of an epoxy material by X-ray analysis

被引：19

作者：

Monney, L

Rouge, N

Dubois, C

Chambaudet, A

机构：

[1] Univ Franche Comte, Equipe Accueil Microanal Mat 473, Lab Microanal Nucl, F-25030 Besancon, France

[2] Univ Franche Comte, Ctr Microscopie Elect, F-25000 Besancon, France

来源：

POLYMER DEGRADATION AND STABILITY | 1998年 / 62卷 / 02期

关键词：

D O I：

10.1016/S0141-3910(98)00023-8

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Photo-chemical degradation of an epoxy resin (DGEBA) cross-linked with methyltetrahydrophthalic anhydride (MTHPA) was studied using electron beam X-ray microanalysis. The evolution of O-K alpha/C-K alpha ratio of the K alpha ray intensities of oxygen and carbon allowed us to detect the organic matrix's chemical modifications during photo-ageing of the irradiated surface. Aside from the fact that the thickness of the photo-oxidized layer can be estimated, the evolution of the O-K alpha/ C-K alpha ratio is expressed as that of the oxidation of the matrix and confirms the hypothesis that the photo-oxidation layer advances at a constant rate, after an establishment period. (C) 1998 Elsevier Science Limited. All rights reserved.

引用

页码：367 / 371

页数：5

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