Growth rate and its limiting process for metalorganic vapor phase epitaxial InN

被引:0
|
作者
Adachi, M [1 ]
Murakami, Y [1 ]
Hashimoto, A [1 ]
Yamamoto, A [1 ]
机构
[1] Fukui Univ, Fac Engn, Dept Elect & Elect Engn, Fukui 9108507, Japan
来源
PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS | 2000年 / 1卷
关键词
InN; MOVPE; growth rate; NH3; decomposition; limiting process;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Growth rate as a function of growth temperature has been studied for MOVPE InN. In the temperature range of 500-600 degreesC, growth rate is increased with increasing growth temperature while TMI supply is constant, and shows a saturation against the increase in TMI supply. At 650 degreesC, on the other hand, such a saturation is not seen for TMI supply up to 28 mu mol/min. As a result of this, a growth rate as high as 0.8 mum/h is obtained at 650(.)degreesC Activation energy (similar to0.76 eV) for saturated growth rate is in good agreement with that (0.79 eV) reported for the thermal decomposition of NH, showing that the growth-rate is dominated by the active nitrogen supply and its saturation is due to the deficiency of active nitrogen. At around 650 degreesC, growth rate is lower than that expected from the values at lower temperatures. This seems to be due to the decomposition of grown InN.
引用
收藏
页码:339 / 342
页数:4
相关论文
共 50 条
  • [41] Metalorganic vapor-phase epitaxial growth simulation to realize high-quality and high-In-content InGaN alloys
    Ohkawa, Kazuhiro
    Ichinohe, Fumitaka
    Watanabe, Tomomasa
    Nakamura, Kenichi
    Iida, Daisuke
    JOURNAL OF CRYSTAL GROWTH, 2019, 512 : 69 - 73
  • [42] Selective growth of GaN/AlGaN microstructures by metalorganic vapor phase epitaxy
    Kato, T
    Honda, Y
    Kawaguchi, Y
    Yamaguchi, M
    Sawaki, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (3B): : 1896 - 1898
  • [43] Effects of growth temperature on the characteristics of ZnO epitaxial films deposited by metalorganic chemical vapor deposition
    Zhang, BP
    Wakatsuki, K
    Binh, NT
    Usami, N
    Segawa, Y
    THIN SOLID FILMS, 2004, 449 (1-2) : 12 - 19
  • [44] Properties of GaN epitaxial layers grown at high growth rates by metalorganic chemical vapor deposition
    Y. Kokubun
    J. Nishio
    M. Abe
    T. Ehara
    S. Nakagomi
    Journal of Electronic Materials, 2001, 30 : 23 - 26
  • [45] Patterned growth of (AlGa)As using metalorganic vapor-phase epitaxy
    Hofmann, L
    Knauer, A
    Rechenberg, I
    Weyers, M
    Stolz, W
    JOURNAL OF CRYSTAL GROWTH, 1999, 206 (04) : 255 - 262
  • [46] Growth characteristics of CdZnTe layers in metalorganic vapor-phase epitaxy
    Yasuda, K
    Araki, N
    Samion, HB
    Miyata, M
    JOURNAL OF CRYSTAL GROWTH, 2000, 214 : 19 - 24
  • [47] Growth of high-quality epitaxial InN film with high-speed reactant gas by organometallic vapor-phase epitaxy
    Yang, FH
    Hwang, JS
    Yang, YJ
    Chen, KH
    Wang, JH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (11B): : L1321 - L1324
  • [48] Properties of GaN epitaxial layers grown at high growth rates by metalorganic chemical vapor deposition
    Kokubun, Y
    Nishio, J
    Abe, M
    Ehara, T
    Nakagomi, S
    JOURNAL OF ELECTRONIC MATERIALS, 2001, 30 (01) : 23 - 26
  • [49] Metalorganic vapor phase epitaxy of manganese gallide thin films and growth temperature dependence of its crystal structure
    Ishii, M
    Iwai, S
    Ueki, T
    Aoyagi, Y
    JOURNAL OF CRYSTAL GROWTH, 1998, 187 (02) : 234 - 239
  • [50] Optical properties of GaN epitaxial layers grown by low-pressure metalorganic vapor phase epitaxy under various growth conditions
    Shirakata, S
    Miyake, H
    Hiramatsu, K
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 109 - 112