Nitridation of indium phosphide (100) substrates has been studied using Auger electron spectroscopy and electron energy loss spectroscopy. After ionic etching by Ar+ ions, metallic indium crystallites are created, and the nitridation of the substrate is performed using a plasma glow discharge cell. We have found that N atoms lead to the desorption of the phosphorus diffused on the surface and the formation of a mixed (In + N) layer on the top of the substrate. (C) 2001 Elsevier Science Ltd. All rights reserved.
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