Direct measurement of electron transmission properties of mask membranes for electron projection lithography

被引：0
|
作者：
Nomura, E [1 ]
Yamashita, H [1 ]
Ochiai, Y [1 ]
Baba, T [1 ]
机构：
[1] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS | 2000年
关键词：
D O I：
10.1109/IMNC.2000.872661
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：138 / 139
页数：2
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