Scattering and coherence in EUVL

被引：8

作者：

Milster, TD ^{[1
]}

Beaudry, NA ^{[1
]}

机构：

[1] Univ Arizona, Ctr Opt Sci, Tucson, AZ 85721 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES II | 1998年 / 3331卷

关键词：

scattering; extreme ultraviolet lithography; coherence;

D O I：

10.1117/12.309613

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We illustrate the importance of considering scattering from the illuminator in extreme ultraviolet lithography (EUVL) systems. Our results indicate that a significant amount of amplitude modulation noise is present in the aerial image if scatter is present in a Kohler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

引用

页码：537 / 543

页数：7