Appearance of direct gap in silicon and germanium nanosize slabs

被引:8
作者
Kholod, AN
Borisenko, VE
Saúb, A
d'Avitaya, FA
Fuhr, J
机构
[1] Belarusian State Univ Informat & Radioelect, Minsk 220013, BELARUS
[2] Ctr Rech Mecanismes Croissance Cristalline, F-13288 Marseille 9, France
[3] Ctr Atom Bariloche, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina
[4] Inst Balseiro, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina
关键词
silicon; germanium; nanosize slabs; band structure;
D O I
10.1016/S0925-3467(01)00075-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ab initio calculations have been performed to obtain electronic structure of hydrogen terminated silicon and germanium slabs of 0.5-2.0 nm in thickness. Comparative results for all low-index orientations are presented. Both silicon and germanium (1 0 0) slabs are found to possess a direct band gap, though the indirect transition is only slightly higher than the direct one. In (1 1 0) oriented silicon slabs there is a direct band gap, whereas germanium slabs are actually indirect band gap semiconductors. Quite opposite situation is observed for (1 1 1) orientation where electronic properties of silicon slabs are very similar to those of the bulk, whereas band structure of germanium slabs has a well-resolved direct band gap, (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:61 / 63
页数:3
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