Simultaneous Chemical and Optical Patterning of Polyacrylonitrile Film by Vapor-Based Reaction

被引:5
作者
Shin, Jae-Won [1 ]
Lee, Choonghyeon [1 ,2 ]
Cha, Sang-Ho [3 ]
Jang, Jyongsik [2 ]
Lee, Kyung Jin
机构
[1] Chungnam Natl Univ, Coll Engn, Dept Fine Chem Engn & Appl Chem, Taejon, South Korea
[2] Seoul Natl Univ, Coll Engn, Sch Chem & Biol Engn, Seoul 151742, South Korea
[3] Kyonggi Univ, Dept Chem Engn, Suwon 443760, South Korea
基金
新加坡国家研究基金会;
关键词
chemical vapor deposition; ethylenediamine; photoluminescence; polyacrylontrile; surface patterning; MODIFIED POLYMER NANOPARTICLES; SURFACE MODIFICATION; THIN-FILMS; DEPOSITION; FABRICATION; PHOTOLITHOGRAPHY; PROGRESS; ARRAYS;
D O I
10.1002/marc.201500078
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The surface of polyacrylonitrile (PAN) film is treated with ethyleneamines (EDA) in a simple chemical vapor phase reaction. Successful introduction of amine functional groups on the cyano group of PAN backbone is verified by FT-IR and NMR measurements. Further UV-vis and photoluminescence analyses show a red shift of the emission peak after repeated EDA treatment, which might be attributed to the formation of imine conjugation from newly formed carbon-nitrogen bonds on the PAN backbone. Further confocal laser scanning microscopy reveals that selective patterning of EDA on PAN films is possible via local polydimethylsiloxane masking. The results indicate that both chemical and optical patterning on PAN film can be realized via a single reaction and show the potential of this novel methodology in selective patterning.
引用
收藏
页码:1192 / 1199
页数:8
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