Structural, optical and electronic properties of P doped p-type ZnO thin film

被引:20
作者
Su, S. C. [1 ]
Yang, X. D. [1 ]
Hu, C. D. [1 ]
机构
[1] S China Normal Univ, Inst Optoelctron Mat & Technol, Dept Educ Guangdong Prov, Key Lab Electroluminescent Devices, Guangzhou 510631, Guangdong, Peoples R China
关键词
ZnO; P doped; Photoluminescence; ZINC-OXIDE; PHOTOLUMINESCENCE; CONDUCTION; CO;
D O I
10.1016/j.physb.2011.01.063
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
P doped ZnO films were grown on quartz by radio frequency-magnetron sputtering method using a ZnO target mixed with 1.5 at% P2O5 in the atmosphere of Ar and O-2 mixing gas. The as-grown P doped ZnO film showed n-type conductivity, which was converted to p-type after 800 degrees C annealing in Ar gas. The P doped ZnO has a resistivity of 20.5 Omega cm (p similar to 2.0 x 10(17) cm(-3)) and a Hall mobility of 2.1 cm(2) V(-1)s(-1). XRD measurement indicated that both the as-grown and the annealed P doped ZnO films had a preferred (0 0 2) orientation. XPS study agreed with the model that the P-Zn-2V(Zn) acceptor complex was responsible for the p-type conductivity as found in the annealed P-doped ZnO. Temperature-dependent photoluminescence (PL) spectrum showed that the dominant band is located at 3.312 eV, which was attributed to the free electronic radiative transition to neutral acceptor level (FA) in ZnO. The P-Zn-2V(Zn) acceptor complex level was estimated to be at E-V= 122 meV. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1533 / 1535
页数:3
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